Reductive Thermal ALD of Pd and Pd2Ge From a Novel Recyclable Palladium Chloride Adduct

Abstract In this work, a new ALD process for palladium metal thin films using dichlorobis(triethylphosphine)palladium(II) (PdCl2(PEt3)2) and 1,4‐bis(trimethylsilyl)‐1,4‐dihydropyrazine ((Me3Si)2DHP) as reactants, is developed. The metal precursor is chosen based on the known reactivity of metal hali...

Fuld beskrivelse

Bibliografiske detaljer

Principais autores:	Anton Vihervaara, Timo Hatanpää, Mikko‐Ilmari Selänne, Kenichiro Mizohata, Mikko Ritala
Format:	Artigo
Sprog:	Inglês
Udgivet:	Wiley-VCH 2025-02-01
Serier:	Advanced Materials Interfaces
Fag:	atomic layer deposition palladium halide adducts palladium thin films reducing agent
Online adgang:	https://doi.org/10.1002/admi.202400579
Tags:	Tilføj Tag Ingen Tags, Vær først til at tagge denne postø!