Dependence of Positive Bias Stress Instability on Threshold Voltage and Its Origin in Solution-Processed Aluminum-Doped Indium Oxide Thin-Film Transistors
The initial electrical characteristics and bias stabilities of thin-film transistors (TFTs) are vital factors regarding the practical use of electronic devices. In this study, the dependence of positive bias stress (PBS) instability on an initial threshold voltage (V<sub>TH</sub>) and its origin wer...
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| Principais autores: | , , , , , , , , , , |
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| 格式: | Artigo |
| 語言: | Inglês |
| 出版: |
MDPI AG
2024-03-01
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| 叢編: | Nanomaterials |
| 主題: | |
| 在線閱讀: | https://www.mdpi.com/2079-4991/14/5/466 |
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