A Study on the Resolution and Depth of Focus of ArF Immersion Photolithography
In this study, the resolution and depth of focus (DOF) of the ArF immersion scanner are measured experimentally according to numerical aperture (<i>NA</i>). Based on the experiment, the theoretical trade-off relationship between the resolution and depth of focus can be confirmed and <i>k</i><sub>1</...
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| Principais autores: | , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI AG
2022-11-01
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| coleção: | Micromachines |
| Assuntos: | |
| Acesso em linha: | https://www.mdpi.com/2072-666X/13/11/1971 |
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