The Influence of Silane Gas Flow Rate on Optoelectronic Properties of µc-Si:H Prepared by HWC-VHF-PECVD Technique
Hydrogenated microcrystalline silicon (µc-Si:H) thin films have been deposited using 10% silane (SiH4) in H2 dilution by Hot Wire Cell Very High Frequency Plasma Enhanced Chemical Vapor Deposition (HWC-VHF-PECVD) technique. The resulted thin film characteristics were systematically studied as a func...
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| Main Authors: | , |
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| Format: | Artigo |
| Language: | Inglês |
| Published: |
ITB Journal Publisher
2013-07-01
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| Series: | Journal of Mathematical and Fundamental Sciences |
| Online Access: | https://journals.itb.ac.id/index.php/jmfs/article/view/38 |
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