Gold- and Silver-Nanoparticle-Assisted Etching of p-Si and n-Si: A Discussion of Etching Behavior Based on Polarization Curves
Metal-assisted etching (metal-assisted chemical etching) is increasingly recognized as a crucial method for fabricating silicon (Si) nanostructures. This process involves the dissolution of Si both directly beneath metal catalysts (local etching) and at locations away from them (remote etching). We...
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| Médium: | Artigo |
| Jazyk: | Inglês |
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The Electrochemical Society of Japan
2025-02-01
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| Edice: | Electrochemistry |
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| On-line přístup: | https://www.jstage.jst.go.jp/article/electrochemistry/93/2/93_24-00134/_html/-char/en |
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