Gold- and Silver-Nanoparticle-Assisted Etching of p-Si and n-Si: A Discussion of Etching Behavior Based on Polarization Curves
Metal-assisted etching (metal-assisted chemical etching) is increasingly recognized as a crucial method for fabricating silicon (Si) nanostructures. This process involves the dissolution of Si both directly beneath metal catalysts (local etching) and at locations away from them (remote etching). We...
I tiakina i:
| Ngā kaituhi matua: | , , |
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| Hōputu: | Artigo |
| Reo: | Inglês |
| I whakaputaina: |
The Electrochemical Society of Japan
2025-02-01
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| Rangatū: | Electrochemistry |
| Ngā marau: | |
| Urunga tuihono: | https://www.jstage.jst.go.jp/article/electrochemistry/93/2/93_24-00134/_html/-char/en |
| Ngā Tūtohu: |
Kāore He Tūtohu, Me noho koe te mea tuatahi ki te tūtohu i tēnei pūkete!
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