Optimization of maskless SU-8 photolithography for fabrication of dense high-aspect-ratio pyrolytic carbon micropillar arrays
This study presents the optimization of maskless UV lithography with SU-8 for the fabrication of 3D electrodes with pyrolytic carbon micropillar arrays. The aim was to maximize the pillar density and enhance the electroactive surface area of the electrodes. For this purpose, the exposure dose at 365...
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| Principais autores: | , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Elsevier
2025-12-01
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| coleção: | Micro and Nano Engineering |
| Assuntos: | |
| Acesso em linha: | http://www.sciencedirect.com/science/article/pii/S2590007225000309 |
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