Laser Produced Hydrophilic and Hydrophobic Silicon Surfaces
Two lasers were utilized for silicon processing using photoelectrochemical etching and laser texturing in order to produce nano/micro structures, respectively. Photoelectrochemical etching process utilizes a CW diode laser of 532 nm wavelength was used to support electrochemical etching for both n-...
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| Principais autores: | , , |
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| פורמט: | Artigo |
| שפה: | Inglês |
| יצא לאור: |
Al-Nahrain Journal for Engineering Sciences
2024-06-01
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| סדרה: | مجلة النهرين للعلوم الهندسية |
| נושאים: | |
| גישה מקוונת: | https://nahje.com/index.php/main/article/view/1167 |
| תגים: |
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