Laser Produced Hydrophilic and Hydrophobic Silicon Surfaces
Two lasers were utilized for silicon processing using photoelectrochemical etching and laser texturing in order to produce nano/micro structures, respectively. Photoelectrochemical etching process utilizes a CW diode laser of 532 nm wavelength was used to support electrochemical etching for both n-...
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| Главные авторы: | , , |
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| Формат: | Artigo |
| Язык: | Inglês |
| Опубликовано: |
Al-Nahrain Journal for Engineering Sciences
2024-06-01
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| Серии: | مجلة النهرين للعلوم الهندسية |
| Предметы: | |
| Online-ссылка: | https://nahje.com/index.php/main/article/view/1167 |
| Метки: |
Нет меток, Требуется 1-ая метка записи!
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