Mitigation of Electro Magnetic Interference by Using C-Shaped Composite Cylindrical Device

The extremely low-frequency (ELF) and its corresponding electromagnetic field influences the yield of CMOS processes in the foundry, especially for high-end equipment such as scanning electron microscopy (SEM) systems, transmission electron microscopy (TEM) systems, focused ion beam (FIB) systems, a...

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Autors principals:	Yu-Lin Song, Manoj Kumar Reddy, Hung-Yung Wen, Luh-Maan Chang
Format:	Artigo
Idioma:	Inglês
Publicat:	MDPI AG 2022-01-01
Col·lecció:	Applied Sciences
Matèries:	permalloy composite material extremely low frequency electromagnetic interference C-shaped cylindrical device
Accés en línia:	https://www.mdpi.com/2076-3417/12/2/882
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