Two-photon states meet polarization-gradient metasurfaces for nanometric, low-dose lateral-displacement metrology
Abstract Accurate displacement sensing is indispensable in advanced semiconductor lithography. Conventional coherent-light-based approaches are hindered by photon budget limitations, slowing down in-situ measurements. In a recent study, Chen et al. introduced a polarization-gradient metasurface inte...
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| Principais autores: | , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
Nature Publishing Group
2026-05-01
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| Series: | Light: Science & Applications |
| Acceso en liña: | https://doi.org/10.1038/s41377-026-02223-7 |
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