Electrochromic properties of WO3 thin films: The role of film thickness
Abstract Tungsten oxide (WO3) thin films with various thicknesses of approximately 36, 72, 108, and 180 nm were prepared using radio frequency sputtering method. Film thickness can be controlled at nanoscale. In addition, X‐ray diffraction, scanning electron microscopy, and Fourier transform infrare...
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| Автори: | , , |
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| Формат: | Artigo |
| Мова: | Inglês |
| Опубліковано: |
Wiley-VCH
2020-08-01
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| Серія: | Analytical Science Advances |
| Предмети: | |
| Онлайн доступ: | https://doi.org/10.1002/ansa.202000072 |
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