Electrochromic properties of WO3 thin films: The role of film thickness
Abstract Tungsten oxide (WO3) thin films with various thicknesses of approximately 36, 72, 108, and 180 nm were prepared using radio frequency sputtering method. Film thickness can be controlled at nanoscale. In addition, X‐ray diffraction, scanning electron microscopy, and Fourier transform infrare...
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| 主要な著者: | , , |
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| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Wiley-VCH
2020-08-01
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| シリーズ: | Analytical Science Advances |
| 主題: | |
| オンライン･アクセス: | https://doi.org/10.1002/ansa.202000072 |
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