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The Influence of Microstructure on Nanomechanical and Diffusion Barrier Properties of Thin PECVD SiOx Films Deposited on Parylene C Substrates

Plasma-enhanced chemical vapor deposition (PECVD) was used to deposit SiOx thin films of varying thicknesses on parylene C substrates, using hexamethyldisiloxane (HMDSO) as a precursor. The microstructure of SiOx coatings was analyzed using X-ray photoemission spectroscopy (XPS), nanoindentation, an...

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Principais autores: David Framil, Matthias Van Gompel, Florian Bourgeois, Ivo Furno, Yves Leterrier
Formato: Artigo
Idioma:Inglês
Publicado em: Frontiers Media S.A. 2019-12-01
coleção:Frontiers in Materials
Assuntos:
thin film
barrier
XPS
ellipsometry
nanoindentation
porosity
Acesso em linha:https://www.frontiersin.org/article/10.3389/fmats.2019.00319/full
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