Effect of grain size on ferroelectric and dielectric properties of thin films prepared by rf-magnetron sputtering

[Formula: see text][Formula: see text]Ti3[Formula: see text](BLT) thin films are promising materials used in non-volatile memories. In this work, BLT films were deposited on Pt(111)/Ti/SiO2/Si substrates by rf-magnetron sputtering method followed by annealing treatments. The microstructures of BLT t...

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Váldodahkkit:	Shuai Ma, Wei Li, Jigong Hao, Yuying Chen, Zhijun Xu
Materiálatiipa:	Artigo
Giella:	Inglês
Almmustuhtton:	World Scientific Publishing 2023-10-01
Ráidu:	Journal of Advanced Dielectrics
Fáttát:	Thin films rf-magnetron sputtering ferroelectric properties dielectric properties
Liŋkkat:	https://www.worldscientific.com/doi/10.1142/S2010135X23500170
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