The Evolution of Lithography: From Resolution Scaling to Manufacturing Constraints
Lithographic patterning continues to evolve under the dual pressure of ever-finer features and manufacturable, cost-effective integration. Beyond headline resolution, industrial adoption is increasingly determined by a small set of coupled metrics: throughput, overlay (registration), defectivity, an...
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| Autors principals: | , , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
MDPI AG
2026-02-01
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| Col·lecció: | Micromachines |
| Matèries: | |
| Accés en línia: | https://www.mdpi.com/2072-666X/17/2/261 |
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