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Optimizing nanostructure deposition process for optical applications

Abstract In many physics and engineering applications requiring exceptional precision, the presence of highly reflective coatings with low thermal noise is of utmost significance. These applications include high‐resolution spectroscopy, optical atomic clocks, and investigations into fundamental phys...

Ausführliche Beschreibung

Gespeichert in:
Hauptverfasser: Joshua Neilson, Veronica Granata, Ofelia Durante, Christopher Ausbeck, Timothy F. Bennett, Fabrizio Bobba, Marco Cannavacciuolo, Giovanni Carapella, Francesco Chiadini, Riccardo DeSalvo, Roberta De Simone, Cinzia Di Giorgio, Rosalba Fittipaldi, Vincenzo Fiumara, Brecken Larsen, Tugdual LeBohec, Seth Linker, Alberto Micco, Marina Mondin, Bhavna Nayak, Antonio Vecchione, Innocenzo M. Pinto, Vincenzo Pierro
Format: Artigo
Sprache:Inglês
Veröffentlicht: Wiley 2024-03-01
Schriftenreihe:Micro & Nano Letters
Schlagworte:
dielectric materials
dielectric thin films
electrodeposition
nanostructured materials
optical films
quartz crystal microbalances
Online-Zugang:https://doi.org/10.1049/mna2.12186
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