Research status and development trend of area selective atomic layer deposition
In recent years, with manufacturing technology advancing into the atomic age, significant progress has been achieved in nano-manufacturing technologies. However, as the dimensions of manufacturing continue to decrease, the conventional “deposition-lithography-etching” nanofabrication process faces u...
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| Principais autores: | , , , , |
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| Formato: | Artigo |
| Idioma: | Chinês |
| Publicado em: |
Shanghai Institute of Microsystem and Information Technology
2026-02-01
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| coleção: | Gongneng cailiao yu qijian xuebao |
| Assuntos: | |
| Acesso em linha: | https://www.jfmd.net.cn/article/doi/10.3724/jfmd.2507041 |
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