Comparative study between the electrochemical behavior of TiN, TiCxNy and CrN hard coatings by using microscopy and electrochemical techniques
Hard thin TiN, TiCxNy and CrN films deposited by Physical Vapor Deposition (PVD) techniques onto steel substrates were immersed in an aggressive environment and evaluated by Atomic Force Microscopy (AFM) and Electrochemical Impedance Spectroscopy (EIS). The mechanical and electrochemical behavior, a...
I tiakina i:
| Ngā kaituhi matua: | , , , |
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| Hōputu: | Artigo |
| Reo: | Inglês |
| I whakaputaina: |
Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol)
2001-01-01
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| Rangatū: | Materials Research |
| Ngā marau: | |
| Urunga tuihono: | http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392001000200017 |
| Ngā Tūtohu: |
Kāore He Tūtohu, Me noho koe te mea tuatahi ki te tūtohu i tēnei pūkete!
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