Nano indentation studies on ceramic thinfilms coatings deposited using sputtering process for energy applications

Nanoindentation technique is generally used for measuring thinfilm mechanical properties such as hardness, modulus and stiffness. Nanoindentation of ceramic thinfilms of SiO2, Si3N4 and Al2O3 was deposited by radio-frequency (RF) magnetron sputtering on the stainless steel (SS304) substrates using a...

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Autors principals:	G. Vijaya, Singh M. Muralidhar, Manish Kumar, Amit Kumar, M.S. Ashok Kumar, Dheeraj Kumar, Shatrudhan Pandey, S.M. Mozammil Hasnain, Abhishek Kumar Singh, Gaurav Kumar
Format:	Artigo
Idioma:	Inglês
Publicat:	KeAi Communications Co., Ltd. 2024-01-01
Col·lecció:	Materials Science for Energy Technologies
Matèries:	Nanoindentation Hardness Ceramic Sputtering Roughness Thinfilms
Accés en línia:	http://www.sciencedirect.com/science/article/pii/S2589299123000447
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