The Growth Characteristics of RF-Magnetron Sputtered Nanocrystalline TiO2 Thin Films
In this paper, RF Magnetron sputtered TiO2 thin films deposited onglass slices at various powers (75,100,125 and 150) Watt for (1.5) hour anddifferent thickness (62.5-88-118 and 132.6) nm, the TiO2 thin films annealed with400°C for 2 hour and the morphology and structure of these films are described...
Tallennettuna:
| Päätekijät: | , , |
|---|---|
| Aineistotyyppi: | Artigo |
| Kieli: | Inglês |
| Julkaistu: |
Unviversity of Technology- Iraq
2018-12-01
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| Sarja: | Engineering and Technology Journal |
| Aiheet: | |
| Linkit: | https://etj.uotechnology.edu.iq/article_175477_f29b1096761aa9993add97c5e6ede210.pdf |
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