Manipulating the processing window of directed self-assembly in contact hole shrinking with binary block copolymer/homopolymer blending

Summary: Directed self-assembly (DSA) lithography has demonstrated significant potential in fabricating integrated circuits. However, DSA encounters limited processing windows due to the requirement for precise matching between the period of block copolymers (BCPs) and graphoepitaxy templates. We pr...

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Detalhes bibliográficos

Principais autores:	Zhiyong Wu, Jiacheng Luo, Luyang Li, Qingshu Dong, Xiaohui Zhang, Zili Li, Yadong Liu, Shengxiang Ji, Weihua Li, Yan Zhang, Shisheng Xiong
Formato:	Artigo
Idioma:	Inglês
Publicado em:	Elsevier 2024-04-01
coleção:	iScience
Assuntos:	Chemistry Materials science Physics
Acesso em linha:	http://www.sciencedirect.com/science/article/pii/S2589004224006461
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