Resist-Free Directed Self-Assembly Chemo-Epitaxy Approach for Line/Space Patterning

This work reports a novel, simple, and resist-free chemo-epitaxy process permitting the directed self-assembly (DSA) of lamella polystyrene-block-polymethylmethacrylate (PS-<i>b</i>-PMMA) block copolymers (BCPs) on a 300 mm wafer. 193i lithography is used to manufacture topographical guiding silicon...

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Bibliographic Details

Main Authors:	Tommaso Jacopo Giammaria, Ahmed Gharbi, Anne Paquet, Paul Nealey, Raluca Tiron
Format:	Artigo
Language:	Inglês
Published:	MDPI AG 2020-12-01
Series:	Nanomaterials
Subjects:	directed self-assembly (DSA) block copolymers (BCPs) chemo-epitaxy polystyrene-block-polymethylmethacrylate (PS-<i>b</i>-PMMA) line/space patterning line edge roughness (LER)
Online Access:	https://www.mdpi.com/2079-4991/10/12/2443
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