EUROPIUM SILICATE THIN FILMS FABRICATED BY RF MAGNETRON SPUTTERING AND THERMAL TREATMENT

We report the fabrication and optical characteristics of europium silicate thin films. Layer structures of Eu2O3/SiOX/Si (100) were deposited by an rf-sputtering method and annealed at 1100°C by rapid thermal annealing (RTA). Two methods were used for the deposition of SiOX layer: One was deposited...

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Номзүйн дэлгэрэнгүй

Үндсэн зохиолчид:	Young Chul Shin, Eun Hong Kim, Tae Geun Kim
Формат:	Artigo
Хэл сонгох:	Inglês
Хэвлэсэн:	Universiti Brunei Darussalam 2017-11-01
Цуврал:	ASEAN Journal on Science and Technology for Development
Нөхцлүүд:	Sputtering photoluminescence photoelectron spectroscopy
Онлайн хандалт:	http://www.ajstd.org/index.php/ajstd/article/view/195
Шошгууд:	Шошго нэмэх Шошго байхгүй, Энэхүү баримтыг шошголох эхний хүн болох!