EUROPIUM SILICATE THIN FILMS FABRICATED BY RF MAGNETRON SPUTTERING AND THERMAL TREATMENT
We report the fabrication and optical characteristics of europium silicate thin films. Layer structures of Eu2O3/SiOX/Si (100) were deposited by an rf-sputtering method and annealed at 1100°C by rapid thermal annealing (RTA). Two methods were used for the deposition of SiOX layer: One was deposited...
Gardado en:
| Principais autores: | , , |
|---|---|
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
Universiti Brunei Darussalam
2017-11-01
|
| Series: | ASEAN Journal on Science and Technology for Development |
| Assuntos: | |
| Acceso en liña: | http://www.ajstd.org/index.php/ajstd/article/view/195 |
| Tags: |
Sen Etiquetas, Sexa o primeiro en etiquetar este rexistro!
|