AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate in the surface-sensitive mode
Thin silicon oxide films deposited on a polypropylene substrate by plasma-enhanced chemical vapor deposition were investigated using atomic force microscopy-based infrared (AFM-IR) nanospectroscopy in contact and surface-sensitive mode. The focus of this work is the comparison of the different measu...
Kaydedildi:
| Asıl Yazarlar: | , , , , |
|---|---|
| Materyal Türü: | Artigo |
| Dil: | Inglês |
| Baskı/Yayın Bilgisi: |
Beilstein-Institut
2024-05-01
|
| Seri Bilgileri: | Beilstein Journal of Nanotechnology |
| Konular: | |
| Online Erişim: | https://doi.org/10.3762/bjnano.15.51 |
| Etiketler: |
Etiket eklenmemiş, İlk siz ekleyin!
|