Sudden Concept Drift Detection and Adaptation in Virtual Metrology for Semiconductor Manufacturing

Virtual metrology (VM) has emerged as a promising technology for semiconductor manufacturing; however, abrupt changes in production conditions can significantly degrade prediction accuracy. Therefore, detecting sudden concept drift becomes crucial. Micro Cluster Nearest Neighbor (MC-NN), a method th...

Täydet tiedot

Bibliografiset tiedot

Päätekijät:	Chi Li, Yu-Ming Hsieh
Aineistotyyppi:	Artigo
Kieli:	Inglês
Julkaistu:	IEEE 2025-01-01
Sarja:	IEEE Access
Aiheet:	Automatic virtual metrology (AVM) concept drift convolutional neural networks (CNN) model rebuilding scheme (MRS) micro cluster nearest neighbor (MC-NN)
Linkit:	https://ieeexplore.ieee.org/document/11142300/
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