Structural, Mechanical and Optical Properties of Plasma-chemical Si-C-N Films
An influence of the substrate temperature in the range of 40-400 °C on the properties of the Si-C-N films deposited by plasma enhanced chemical vapor deposition (PECVD) technique using hexamethyldisilazane is analyzed. Study of the structure, chemical bonding, surface morphology, mechanical properti...
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| Principais autores: | , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
Sumy State University
2014-11-01
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| Series: | Журнал нано- та електронної фізики |
| Assuntos: | |
| Acceso en liña: | http://jnep.sumdu.edu.ua/download/numbers/2014/4/articles/jnep_2014_V6_04047.pdf |
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