Chromium oxide – A novel sacrificial layer material for MEMS/NEMS and micro/nanofluidic device fabrication
Free standing membranes for fluidic devices typically require long etching times due to the slow, diffusion limited exchange of etchant and etch products when large etch distances are involved. In these cases, high etch selectivity is required between the sacrificial and channel-wall materials. Here...
Enregistré dans:
| Auteurs principaux: | , , , , |
|---|---|
| Format: | Artigo |
| Langue: | Inglês |
| Publié: |
Elsevier
2022-08-01
|
| Collection: | Micro and Nano Engineering |
| Sujets: | |
| Accès en ligne: | http://www.sciencedirect.com/science/article/pii/S2590007222000429 |
| Tags: |
Pas de tags, Soyez le premier à ajouter un tag!
|