Vibrational fingerprints of ferroelectric HfO2
Abstract Hafnia (HfO2) is a promising material for emerging chip applications due to its high-κ dielectric behavior, suitability for negative capacitance heterostructures, scalable ferroelectricity, and silicon compatibility. The lattice dynamics along with phononic properties such as thermal conduc...
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| Päätekijät: | , , , , , , , , |
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| Aineistotyyppi: | Artigo |
| Kieli: | Inglês |
| Julkaistu: |
Nature Portfolio
2022-03-01
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| Sarja: | npj Quantum Materials |
| Linkit: | https://doi.org/10.1038/s41535-022-00436-8 |
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