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Development of Vacuum-Chamber-Type Capacitive Micro-Pressure Sensors

This study presents the development of a capacitive pressure sensor tailored for measuring the dynamic pressure of flow fields. The sensor is fabricated using the UMC 0.18 μm CMOS-MEMS process, incorporated with additional post-processing steps such as metal wet etching, supercritical CO<sub>2</sub>...

Whakaahuatanga katoa

I tiakina i:
Ngā taipitopito rārangi puna kōrero
Ngā kaituhi matua: Lung-Jieh Yang, De-Yu Jiang, Wei-Chen Wang, Chandrashekhar Tasupalli, Horng-Yuan Shih, Yi-Jen Wang
Hōputu: Artigo
Reo:Inglês
I whakaputaina: MDPI AG 2025-11-01
Rangatū:Micromachines
Ngā marau:
Urunga tuihono:https://www.mdpi.com/2072-666X/16/11/1290
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