Development of Vacuum-Chamber-Type Capacitive Micro-Pressure Sensors
This study presents the development of a capacitive pressure sensor tailored for measuring the dynamic pressure of flow fields. The sensor is fabricated using the UMC 0.18 μm CMOS-MEMS process, incorporated with additional post-processing steps such as metal wet etching, supercritical CO<sub>2</sub>...
I tiakina i:
| Ngā kaituhi matua: | , , , , , |
|---|---|
| Hōputu: | Artigo |
| Reo: | Inglês |
| I whakaputaina: |
MDPI AG
2025-11-01
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| Rangatū: | Micromachines |
| Ngā marau: | |
| Urunga tuihono: | https://www.mdpi.com/2072-666X/16/11/1290 |
| Ngā Tūtohu: |
Kāore He Tūtohu, Me noho koe te mea tuatahi ki te tūtohu i tēnei pūkete!
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