High Rate Deposition of Piezoelectric AlScN Films by Reactive Magnetron Sputtering from AlSc Alloy Targets on Large Area
This paper reports on the deposition and characterization of piezoelectric Al<sub>X</sub>Sc<sub>1-X</sub>N (further: AlScN) films on Si substrates using AlSc alloy targets with 30 at.% Sc. Films were deposited on a Ø200 mm area with deposition rates of 200 nm/min using a reactive magnetron sputterin...
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| Hlavní autoři: | , , , , , |
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| Médium: | Artigo |
| Jazyk: | Inglês |
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MDPI AG
2022-09-01
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| Edice: | Micromachines |
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| On-line přístup: | https://www.mdpi.com/2072-666X/13/10/1561 |
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