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Advances in atmospheric-pressure particle atomic layer deposition

Atmospheric pressure particle atomic layer deposition (AP-PALD) shows promising potentials in the fields of energy and catalytic materials due to its ability in precisely modifying the surfaces of functional materials operated at atmospheric or near-atmospheric pressure. This technique eliminates th...

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Principais autores: Guanghui YAN, Gaoshan HUANG, Xueqiang LU, Xueqin ZUO, Dongdong MI, Guoxiang CHEN, Yi OUYANG, Xiangzhong CHEN, Zhihao BAO, Yongfeng MEI, Jianjun SHI
Formato: Artigo
Idioma:Chinês
Publicado em: Shanghai Institute of Microsystem and Information Technology 2025-06-01
coleção:Gongneng cailiao yu qijian xuebao
Assuntos:
particle atomic layer deposition (pald)
atmospheric pressure
spatial atomic layer deposition (s-ald)
temporal atomic layer deposition (t-ald)
nanoparticle
conformality
Acesso em linha:https://www.jfmd.net.cn/article/doi/10.20027/j.gncq.2025.0021
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