Advances in atmospheric-pressure particle atomic layer deposition

Atmospheric pressure particle atomic layer deposition (AP-PALD) shows promising potentials in the fields of energy and catalytic materials due to its ability in precisely modifying the surfaces of functional materials operated at atmospheric or near-atmospheric pressure. This technique eliminates th...

Celý popis

Podrobná bibliografie

Hlavní autoři:	Guanghui YAN, Gaoshan HUANG, Xueqiang LU, Xueqin ZUO, Dongdong MI, Guoxiang CHEN, Yi OUYANG, Xiangzhong CHEN, Zhihao BAO, Yongfeng MEI, Jianjun SHI
Médium:	Artigo
Jazyk:	Chinês
Vydáno:	Shanghai Institute of Microsystem and Information Technology 2025-06-01
Edice:	Gongneng cailiao yu qijian xuebao
Témata:	particle atomic layer deposition (pald) atmospheric pressure spatial atomic layer deposition (s-ald) temporal atomic layer deposition (t-ald) nanoparticle conformality
On-line přístup:	https://www.jfmd.net.cn/article/doi/10.20027/j.gncq.2025.0021
Tagy:	Přidat tag Žádné tagy, Buďte první, kdo vytvoří štítek k tomuto záznamu!