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Raman Study of Polycrystalline Si<sub>3</sub>N<sub>4</sub> Irradiated with Swift Heavy Ions

A depth-resolved Raman spectroscopy technique was used to study the residual stress profiles in polycrystalline silicon nitride that was irradiated with Xe (167 MeV, 1 × 10<sup>11</sup> cm<sup>−2</sup> ÷ 4.87 × 10<sup>13</sup> cm<sup>−2</sup>) and Bi (710 MeV, 1 × 10<sup>11</sup> cm<sup>−2</sup> ÷ 1...

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Principais autores: Ainash Zhumazhanova, Alisher Mutali, Anel Ibrayeva, Vladimir Skuratov, Alma Dauletbekova, Ekaterina Korneeva, Abdirash Akilbekov, Maxim Zdorovets
格式: Artigo
语言:Inglês
出版: MDPI AG 2021-10-01
丛编:Crystals
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在线阅读:https://www.mdpi.com/2073-4352/11/11/1313
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