Raman Study of Polycrystalline Si<sub>3</sub>N<sub>4</sub> Irradiated with Swift Heavy Ions
A depth-resolved Raman spectroscopy technique was used to study the residual stress profiles in polycrystalline silicon nitride that was irradiated with Xe (167 MeV, 1 × 10<sup>11</sup> cm<sup>−2</sup> ÷ 4.87 × 10<sup>13</sup> cm<sup>−2</sup>) and Bi (710 MeV, 1 × 10<sup>11</sup> cm<sup>−2</sup> ÷ 1...
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| Principais autores: | , , , , , , , |
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| 格式: | Artigo |
| 语言: | Inglês |
| 出版: |
MDPI AG
2021-10-01
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| 丛编: | Crystals |
| 主题: | |
| 在线阅读: | https://www.mdpi.com/2073-4352/11/11/1313 |
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