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Application Properties of ZnO and AZO Thin Films Obtained by the ALD Method

The thin layers of ZnO and ZnO: Al (Al doped zinc oxide—AZO) were deposited by the atomic deposition layer (ALD) method on silicon and glass substrates. The structures were deposited using diethylzinc (DEZ) and deionized water as zinc and oxygen precursors. A precursor of trimethylaluminum (TMA) was...

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Autori principali: Barbara Swatowska, Wiesław Powroźnik, Halina Czternastek, Gabriela Lewińska, Tomasz Stapiński, Rafał Pietruszka, Bartłomiej S. Witkowski, Marek Godlewski
Natura: Artigo
Lingua:Inglês
Pubblicazione: MDPI AG 2021-10-01
Serie:Energies
Soggetti:
AZO thin films
ALD technique
optical properties
structural properties
electrical parameters
Accesso online:https://www.mdpi.com/1996-1073/14/19/6271
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