Ion Compensation-Assisted Photolithography Enables High-Resolution Electrolytes for Neuromorphic Transistors
Highlights Ion compensation–assisted photolithography (ICAP) combines UV-triggered dual crosslinking with a post-patterning ion replenishment step, enabling patterned electrolytes with a spatial resolution of 2 μm, a capacitance of 15.6 μF cm−2. ICAP-patterned electrolytes provide array-level ionic...
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| 主要な著者: | , , , , , , |
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| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
SpringerOpen
2026-07-01
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| シリーズ: | Nano-Micro Letters |
| 主題: | |
| オンライン･アクセス: | https://doi.org/10.1007/s40820-026-02288-4 |
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