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Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography

The self-assembly of a lamellar-forming polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) diblock copolymer (DBCP) was studied herein for surface nanopatterning. The DBCP was synthesized by sequential living anionic polymerization of styrene and hexamethylcyclotrisiloxane (D3). The number average...

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Principais autores: Dipu Borah, Cian Cummins, Sozaraj Rasappa, Ramsankar Senthamaraikannan, Mathieu Salaun, Marc Zelsmann, George Liontos, Konstantinos Ntetsikas, Apostolos Avgeropoulos, Michael A. Morris
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI AG 2018-01-01
coleção:Nanomaterials
Assuntos:
directed self-assembly
lamellar diblock copolymer
polyhedral oligomeric silsesquioxane (POSS)
nanoimprint lithography
pattern transfer
Acesso em linha:http://www.mdpi.com/2079-4991/8/1/32
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