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Low-Temperature Enhancement-Mode Amorphous Oxide Thin-Film Transistors in Solution Process Using a Low-Pressure Annealing

The interest in low processing temperature for printable transistors is rapidly increasing with the introduction of a new form factor in electronics and the growing importance of high throughput. This paper reports the fabrication of low-temperature-processable enhancement-mode amorphous oxide thin-...

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Principais autores: Won Park, Jun-Hyeong Park, Jun-Su Eun, Jinuk Lee, Jeong-Hyeon Na, Sin-Hyung Lee, Jaewon Jang, In Man Kang, Do-Kyung Kim, Jin-Hyuk Bae
Format: Artigo
Sprog:Inglês
Udgivet: MDPI AG 2023-08-01
Serier:Nanomaterials
Fag:
metal-oxide semiconductor
thin-film transistors
solution process
low processing temperature
enhancement mode
low-pressure annealing
Online adgang:https://www.mdpi.com/2079-4991/13/15/2231
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