Low pressure chemical vapor deposition of β-Ga2O3 thin films: Dependence on growth parameters

Por Zixuan Feng, Md Rezaul Karim, Hongping Zhao
Publicado em 2019-02-01

Phase transformation in MOCVD growth of (AlxGa1−x)2O3 thin films

Por A F M Anhar Uddin Bhuiyan, Zixuan Feng, Jared M. Johnson, Hsien-Lien Huang, Jith Sarker, Menglin Zhu, Md Rezaul Karim, Baishakhi Mazumder, Jinwoo Hwang, Hongping Zhao
Publicado em 2020-03-01