Silicon diffusion control in atomic-layer-deposited Al(2)O(3)/La(2)O(3)/Al(2)O(3) gate stacks using an Al(2)O(3) barrier layer

Por Wang, Xing, Liu, Hong-Xia, Fei, Chen-Xi, Yin, Shu-Ying, Fan, Xiao-Jiao
Publicado no Nanoscale Res Lett (2015)