Laser deposition of CNx films combined with RF and hollow cathode discharges
Pulsed laser deposition (PLD) combined with additional RF and hollow cathode (HC) discharges for deposition of CNx films are studied. The RF discharge was held between two electrodes situated parallel to plasma plume from a graphite target. Influence of RF power, nitrogen pressure, modulation freque...
Kaydedildi:
| Yayımlandı: | Superficies y vacío |
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| Asıl Yazarlar: | , , , , , |
| Materyal Türü: | Artigo |
| Dil: | Inglês |
| Baskı/Yayın Bilgisi: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
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| Konular: | |
| Online Erişim: | https://www.redalyc.org/articulo.oa?id=94200980 |
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