SnO2:F thin films deposited by RF magnetron sputtering: effect of the SnF2 amount in the target on the physical properties
SnO2:F thin films were prepared by RF magnetron sputtering onto glass substrates using SnF2 as fluorine source. The films were deposited under a mixed argon/hydrogen atmosphere at a substrate temperature of 500◦ C. The X-ray diffraction shows that polycrystalline films were grown with a phases mixtu...
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| Publicado no: | Revista Mexicana de Física |
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| Principais autores: | , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Sociedad Mexicana de Física A.C.
2013
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| Assuntos: | |
| Acesso em linha: | https://www.redalyc.org/articulo.oa?id=57027861009 |
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