Characterization of Thin Films Deposited by Physical Vapor Deposition (PVD), Using Electrochemical Impedance Spectroscopy (EIS) Technique

In this paper the performance against corrosion of a thin film of NiCu deposited by Physical Vapor Deposition at two different times of deposition, was evaluated. Electrochemical Impedance results in NaCl solution, showed a gradual increase in resistivity due to the degradation of the film (delamina...

Disgrifiad llawn

Wedi'i Gadw mewn:
Manylion Llyfryddiaeth
Cyhoeddwyd yn:Journal of the Mexican Chemical Society
Prif Awduron: Jorge Morales Hernández, Araceli Mandujano Ruíz, Julieta Torrez-González, René Antaño López, Federico Castañeda Zaldivar, Francisco Javier Espinoza Beltrán
Fformat: Artigo
Iaith:Inglês
Cyhoeddwyd: Sociedad Química de México 2015
Pynciau:
Multidisciplinaria (Ciencias Naturales y Exactas)
PVD
Corrosion
Thin films
nanodefects
DC sputtering
Mynediad Ar-lein:https://www.redalyc.org/articulo.oa?id=47545630009
Tagiau: Ychwanegu Tag
Dim Tagiau, Byddwch y cyntaf i dagio'r cofnod hwn!

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