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Improvement of Resistive Switching Performance in Sulfur-Doped HfOx-Based RRAM

In order to improve the electrical performance of resistive random access memory (RRAM), sulfur (S)-doping technology for HfOx-based RRAM is systematically investigated in this paper. HfOx films with different S-doping contents are achieved by atmospheric pressure chemical vapor deposition (APCVD) u...

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Detalhes bibliográficos
Publicado no:Materials (Basel)
Main Authors: Zhang, Zhenzhong, Wang, Fang, Hu, Kai, She, Yu, Song, Sannian, Song, Zhitang, Zhang, Kailiang
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2021
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC8233777/
https://ncbi.nlm.nih.gov/pubmed/34208616
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma14123330
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