Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO(2) Coating

The chemical, structural, morphological, and optical properties of Al-doped TiO(2) thin films, called TiO(2)/Al(2)O(3) nanolaminates, grown by plasma-enhanced atomic layer deposition (PEALD) on p-type Si <100> and commercial SLG glass were discussed. High-quality PEALD TiO(2)/Al(2)O(3) nanolam...

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Bibliographische Detailangaben
Veröffentlicht in:Micromachines (Basel)
Hauptverfasser: Chiappim, William, Testoni, Giorgio, Miranda, Felipe, Fraga, Mariana, Furlan, Humber, Saravia, David Ardiles, Sobrinho, Argemiro da Silva, Petraconi, Gilberto, Maciel, Homero, Pessoa, Rodrigo
Format: Artigo
Sprache:Inglês
Veröffentlicht: MDPI 2021
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Article
Online Zugang:https://ncbi.nlm.nih.gov/pmc/articles/PMC8223979/
https://ncbi.nlm.nih.gov/pubmed/34063804
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi12060588
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