A carregar...

Single Femtosecond Laser-Pulse-Induced Superficial Amorphization and Re-Crystallization of Silicon

Superficial amorphization and re-crystallization of silicon in <111> and <100> orientation after irradiation by femtosecond laser pulses (790 nm, 30 fs) are studied using optical imaging and transmission electron microscopy. Spectroscopic imaging ellipsometry (SIE) allows fast data acqui...

ver descrição completa

Na minha lista:
Detalhes bibliográficos
Publicado no:Materials (Basel)
Main Authors: Florian, Camilo, Fischer, Daniel, Freiberg, Katharina, Duwe, Matthias, Sahre, Mario, Schneider, Stefan, Hertwig, Andreas, Krüger, Jörg, Rettenmayr, Markus, Beck, Uwe, Undisz, Andreas, Bonse, Jörn
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2021
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC8037179/
https://ncbi.nlm.nih.gov/pubmed/33801726
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma14071651
Tags: Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!