Spassov, D., Paskaleva, A., Guziewicz, E., Davidović, V., Stanković, S., Djorić-Veljković, S., . . . Stojadinović, N. (2021). Radiation Tolerance and Charge Trapping Enhancement of ALD HfO(2)/Al(2)O(3) Nanolaminated Dielectrics. Materials (Basel).
Chicago ZitierstilSpassov, Dencho, Albena Paskaleva, Elżbieta Guziewicz, Vojkan Davidović, Srboljub Stanković, Snežana Djorić-Veljković, Tzvetan Ivanov, Todor Stanchev, und Ninoslav Stojadinović. "Radiation Tolerance and Charge Trapping Enhancement of ALD HfO(2)/Al(2)O(3) Nanolaminated Dielectrics." Materials (Basel) 2021.
MLA ZitierstilSpassov, Dencho, et al. "Radiation Tolerance and Charge Trapping Enhancement of ALD HfO(2)/Al(2)O(3) Nanolaminated Dielectrics." Materials (Basel) 2021.
Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.