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Development, Processing and Applications of a UV-Curable Polymer with Surface Active Thiol Groups
We present here a novel resist formulation with active thiol groups at the surface. The material is UV curable, and can be patterned at the micro- and nanoscale by UV nanoimprint lithography. The resist formulation development, its processing, patterning and surface characterization are presented he...
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| Publicado no: | Nanomaterials (Basel) |
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| Main Authors: | , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2020
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7558128/ https://ncbi.nlm.nih.gov/pubmed/32937782 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano10091829 |
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