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Development, Processing and Applications of a UV-Curable Polymer with Surface Active Thiol Groups

We present here a novel resist formulation with active thiol groups at the surface. The material is UV curable, and can be patterned at the micro- and nanoscale by UV nanoimprint lithography. The resist formulation development, its processing, patterning and surface characterization are presented he...

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Detalhes bibliográficos
Publicado no:Nanomaterials (Basel)
Main Authors: Müller, Manuel, Nasri, Rukan, Tiemann, Lars, Fernandez-Cuesta, Irene
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2020
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC7558128/
https://ncbi.nlm.nih.gov/pubmed/32937782
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano10091829
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