Caricamento...
Low-Temperature Atomic Layer Deposited Oxide on Titanium Nitride Electrodes Enables Culture and Physiological Recording of Electrogenic Cells
The performance of electrode arrays insulated by low-temperature atomic layer deposited (ALD) titanium dioxide (TiO(2)) or hafnium dioxide (HfO(2)) for culture of electrogenic cells and for recording of extracellular action potentials is investigated. If successful, such insulation may be considered...
Salvato in:
| Pubblicato in: | Front Neurosci |
|---|---|
| Autori principali: | , , , , , , |
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
Frontiers Media S.A.
2020
|
| Soggetti: | |
| Accesso online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7530285/ https://ncbi.nlm.nih.gov/pubmed/33071735 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3389/fnins.2020.552876 |
| Tags: |
Aggiungi Tag
Nessun Tag, puoi essere il primo ad aggiungerne! !
|